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OpenSweden

Deep Reaction Ion Etcher (DRIE)

Key facts

Country
Sweden
Region
SE121
Estimated value
not stated
Procedure
open
Published
Bids due
Source
TED (EU tenders)

Description

Myfab Uppsala aims at purchasing a Deep Reaction Ion Etcher (DRIE). The purpose of the tool is to transfer patterns defined by e.g., photo- and electron beam lithography covering the pattens size range from all substrate range down to a few nanometres. The system will be used by many operators in a university laboratory environment. It must be easy to use and be insensitive to frequent change of process between batches. The processes include broad range of etching capability: low to high etch rate, wafer dicing, high uniformity, high open area, high aspect ratio, and nanometre scale. The…

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