Nachrüstung eines Planar-biaxial-Prüfsystems
Technische Universität Bergakademie FreibergGermany, DED43
OpenUnited Kingdom
Supply and Commissioning of an Inductively Coupled Plasma Etcher
Key facts
- Country
- United Kingdom
- Region
- UKM82
- Estimated value
- not stated
- Published
- Source
- UK Find a Tender
Description
An Inductively Coupled Plasma Etcher is sought to process semiconductor materials such as (but not limited to) Gallium Nitride and Silicon. The ideal system will be deployed for academic research and located within a cleanroom micro-fabrication facility.
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